TMAl IC

Product Line High purity metalorganics

TMAl IC is an aluminum precursor for atomic layer deposition (ALD) processes.

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TMAl IC (High purity metalorganics)

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TMAl IC (High purity metalorganics)

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  • ProductChemicalFamily

    High Purity Metalorganics
  • ProductCASnr

    75-24-1
  • ProductPhysicalForm

    Liquid
  • ProductMolecularWeight

    72.1
  • ProductChemicalsName

    Trimethylaluminum
  • Molecular drawing

    High Purity Metalorganics
  • ProductApplications

    For atomic layer deposition (ALD) in Silicon semiconductor applications we offer our TMAL IC grade. This grade offers ppb level of trace metals specifications. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.

Use Cases

Electronics

MsbLongDescription

TMAl IC is an aluminum precursor (Select Semiconductor Grade) for deposition technologies used in the silicon semiconductors industry.

ProductFunctions

  • Precursor

MsbApplications

  • Electronic Devices
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For more information about TMAl IC, please contact our technical experts. We look forward to hearing from you.

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