TMAl IC
Product Line High purity metalorganics
TMAl IC is an aluminum precursor for atomic layer deposition (ALD) processes.
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ProductChemicalFamily
High Purity Metalorganics -
ProductCASnr
75-24-1 -
ProductPhysicalForm
Liquid -
ProductMolecularWeight
72.1 -
ProductChemicalsName
Trimethylaluminum
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Molecular drawing
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ProductApplications
For atomic layer deposition (ALD) in Silicon semiconductor applications we offer our TMAL IC grade. This grade offers ppb level of trace metals specifications. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.
Downloads
Product Data Sheets
PDS TMAL IC - Electronics (English)
- Product Data Sheet | application/pdf (53,7 KB) | English
Other Documents
Brochure High Purity Metalorganics (HPMO)
- Brochure | application/pdf (175,7 KB) | English
Use Cases
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For more information about TMAl IC, please contact our technical experts. We look forward to hearing from you.