TMAl LO is an aluminum precursor for the deposition of compound semiconductors, especially synthesized to meet ultra low-oxygen requirements.
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TMAl LO (High purity metalorganics)
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TMAl LO (High purity metalorganics)
ProductChemicalFamily
High Purity Metalorganics
ProductCASnr
75-24-1
ProductPhysicalForm
Liquid
ProductMolecularWeight
72.1
ProductChemicalsName
Trimethylaluminum
Molecular drawing
ProductApplications
For very oxygen sensitive applications, we have a unique grade to meet your demanding applications. Our special grade TMAL LO has an oxygen specification below 1 ppm oxygen. TMAL LO is the preferred grade by many customers for applications such as laser diodes, sensors (VCSEL), concentrated photovoltaic cells (CPV), power semiconductor devices (GaN on Si) and phosphide LED. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.
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