TEAl SSG is an aluminum precursor for atomic layer deposition (ALD) processes.
Chemical family
High Purity Metalorganics
CAS number
97-93-8
Physical form
Liquid
Regional availability
Africa, Asia, Asia Pacific, China, Europe, Global, India, Latin America, Middle East, North America, Oceania
Molecular Weight
114.2
Chemical name
Triethylaluminum
Molecular drawing
Applications
TEAl SSG is used as a high quality aluminum precursor for atomic layer deposition (ALD) processes in the silicon semiconductor industry.
Containers are fabricated from stainless steel with an electropolished internal finish and are equipped with dip tube for top discharge and diaphragm valves. The diaphragm valves are equipped with metal gasket face seal connections.
For more information about TEAl SSG, please contact our technical experts. We look forward to hearing from you.
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