TMAl LO is an aluminum precursor for the deposition of compound semiconductors, especially synthesized to meet ultra low-oxygen requirements.
Chemical family
High Purity Metalorganics
CAS number
75-24-1
Physical form
Liquid
Molecular Weight
72.1
Chemical name
Trimethylaluminum
Molecular drawing
Applications
For very oxygen sensitive applications, we have a unique grade to meet your demanding applications. Our special grade TMAL LO has an oxygen specification below 1 ppm oxygen. TMAL LO is the preferred grade by many customers for applications such as laser diodes, sensors (VCSEL), concentrated photovoltaic cells (CPV), power semiconductor devices (GaN on Si) and phosphide LED. Our trimethylaluminum is supplied in canisters (cylinders) made from stainless steel with an electropolished internal finish. The cylinders are equipped with manual or pneumatic diaphragm valves. The valves are equipped with metal gasket VCR-connections.
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